THE INFLUENCE OF N2 AND Si ON PROPERTIES OF WC/C COATINGS DEPOSITED BY DC MAGNETRON SPUTERING TECHNIQUE

Daniel Kottfer, Peter Horňák, Lukasz Kaczmarek, Marek Vrabeľ, Ján Balko, František Rehák

Abstract


In this article, various coating properties (thickness, COF, hardness) of WC/C layer deposited on steel and Si based substrate material by process of direct current magnetron sputtering (DC MS) without reactive gas as well as with employed reactive gases (N2 and SiH4+N2) were investigated.

Keywords


WC/C coating; DC magnetron sputtering; properties; COF

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